Early Registration Deadline Extended to July 14 for Photopolymerization Fundamentals 2019

The early registration deadline has been extended for Photopolymerization Fundamentals 2019, the scientific conference for the photopolymerization industry, taking place Sept. 14-18, 2019, at the Monterey Plaza Hotel & Spa in Monterey, California. Registration fees increase $125 after July 14.

Highlights of the meeting include:
• Scientific presentations on a wide range of photopolymerization topics
• An open atmosphere where interaction and technical networking are encouraged
• A poster session and vendor exhibit
• Reduced rates for students to promote interaction between industrial scientists and students

Invited speakers who plan to attend and present include Christopher Bowman, University of Colorado; Christopher Ellison, University of Minnesota; Allan Guymon, University of Iowa; Jeffrey Stansbury, University of Colorado Denver; Marco Sangermano, Politecnico di Torino; Thomas Griesser, University of Leoben; Céline Croutxé-Barghorn, Université de Haute Alsace; Xavier Allonas, Université de Haute Alsace; Jason Burdick, University of Pennsylvania; Stephanie Bryant, University of Colorado; Sandra Schloegl, Polymer Competence Center Leoben GmbH; Tim Scott, University of Michigan; Chris Kloxin, University of Delaware; Rong Tong, Virginia Polytechnic Institute; and Alan Aguire, Tecnológico de Monterrey.

The meeting includes a short course with a series of four presentations from leaders in the photopolymerizations field.
• Chris Bowman, University of Colorado: Photopolymerization Kinetics
• Allan Guymon, University of Iowa: Statistical Design of Experiments
• Jon Scholte, Sartomer: Photopolymerization Chemistry & Curing Methods
• Mike Idacavage, Colorado Photopolymer Solutions: Formulations & 3D Printing

The meeting also includes a tabletop vendor exhibit concurrent with the poster sessions.
• Sponsors for the meeting are IGM Resins, FlackTek and Heraeus Noblelight.
• Vendors who have committed to attend include IGM Resins, FlackTek, Heraeus Noblelight, Allnex, Sartomer, Honle UV, Daicel and Colorado Photopolymer Solutions.

This conference is presented by RadTech – The Association for UV & EB Technology and Colorado Photopolymer Solutions (CPS).

For more information, visit http://radtechintl.org/Photopolymer2019. For more information about exhibiting, visit http://radtechintl.org/Photopolymer2019#pf-sponsor.

The conference chair is Professor Chris Bowman from the University of Colorado. For more information, contact Neil Cramer at neil.cramer@colorado.edu.