RadTech International North America is partnering with the National Institute of Standards & Technology (NIST) to organize a two-day roadmapping workshop for the use of photopolymer materials in additive manufacturing. Registration is open.
The Photopolymer Additive Manufacturing Workshop – Roadmapping a Future for Stereolithography, Inkjet and Beyond is slated for Oct. 29-30, 2019, at NIST, Boulder, Colorado.
Here is the first look at the workshop’s program. Panel participants are subject to change.
Panel I: Sustainable, Hybrid and Emerging Material Systems
- Moderator: Mike Idacavage, RadTech
- Noud Steffen, DSM
- Jeff Klang, Sartomer
- Alex Mejiritski, Spectra Group Limited
- Neil Cramer, Colorado Photopolymer Solutions
- Chris Williams, DREAMS Laboratory at Virginia Tech
- Rachel Davis, Azul3D
- Justin Poelma, Carbon
Panel II: Novel, AM-specific characterization
- Moderator: Callie Higgins, NIST
- Jason Killgore, NIST
- Max Zieringer, Formlabs
- Matthew Herman, Los Alamos National Laboratory
- Jeff Stansbury, University of Colorado
Panel III: Industry Applications and Developing Markets
- Moderator: Beau Jackson, 3D Printing Industry
- Bob Gafvert, Carbon
- Tom Bugnitz, Manufacturing Institute
- Denis Cormier, Rochester Institute of Technology
- Maxim Shusteff, Lawrence Livermore National Laboratory
- Scott Turner, 3D Systems
- Spencer Loveless, Dustless Technologies
Panel IV: Health, Safety, and Regulation in AM
- Moderator: Tom McKeag, The Berkeley Center for Green Chemistry
- James Coburn, Food and Drug Administration
- Treye Thomas, Consumer Product Safety Commission
- Gary Roth, National Institute for Occupational Safety and Health Office of Pollution Prevention and Toxics, Environmental Protection Agency
Panel V: Moon-shot Ideas in AM
- Moderator: Simon Lancaster, Apple
- Charlie Wood, Fast Radius
- Will Tashman, Uncountable
- John La Scala, Army Research Laboratory
For more information, visit www.nist.gov/news-events/events/2019/10/photopolymer-additive-manufacturing-workshop-roadmapping-future.
