2020 RadTech Conference Abstract Deadlines Near
Abstract deadlines are approaching for the 2020 RadTech UV+EB Technology Conference and the 2020 IUVA Americas Conference, scheduled for March 8 through 11, 2020. For the first time, the conferences will be co-located at the Disney Coronado Springs Resort in Orlando, Florida, offering attendees a complete picture of the UV/EB industry, including applications in curing, disinfection, sterilization, sensing and more. The co-located events are expected to attract more than 1,400 total attendees.
Abstracts for RadTech conference presentations are due September 20, 2019. Presentations should be no longer than 25 minutes with five minutes for questions. Potential presenters may fill out the online Abstract Submission Form. The description should be sufficiently comprehensive to allow assessment of the paper’s scope and content. For more information, visit https://radtech2020.com/index.php/call-for-papers/ or contact Mickey Fortune at [email protected] or 240.643.0517.
NIST, RadTech Developing Workshop for Use of Photopolymer Materials in Additive Manufacturing
In a partnership with the National Institute of Standards and Technology (NIST), RadTech is organizing a two-day road-mapping workshop for the use of photopolymer materials in additive manufacturing. The workshop is set for October 29 and 30 in Boulder, Colorado.
Member feedback is sought on setting workshop goals and program details. Members and others who are actively involved in the 3D printing and additive manufacturing supply chain can help by providing comments and ideas to Mickey Fortune at [email protected].
RadTech Fall Member Meeting Set for November 4 in Michigan
The RadTech Fall Member Meeting is scheduled for November 4 at the Dearborn Inn, Dearborn, Michigan.
Meetings and new initiatives will focus on UV LED, 3D printing, application support, transportation, and printing and packaging. RadTech also will host tours at Ford Motor Company in the morning before the meeting.
On November 5, Plastics Decorating magazine (published by Peterson Publications, which also publishes UV+EB Technology) will present a Surface Summit Event at the Dearborn Inn. RadTech is a co-sponsor of the event.
Registration for the Fall Member Meeting is open. Register, check for more information and see updates at www.radtech.org.
Abstracts Due November 30 for ICULTA 2020 in Berlin
Two years after the first successful International Conference on UV LED Technologies & Applications (ICULTA) the next conference is set for April 26 through 29, 2020, at the MELIÃ Hotel in Berlin, Germany. The submission deadline for oral and poster presentation abstracts is November 30.
ICULTA will bring together pioneers, leaders and experts from science and industry to discuss progress and innovations in the development of UV LEDs and the broad spectrum of applications. The conference is jointly organized by the German consortium Advanced UV for Life and the International Ultraviolet Association (IUVA). The event offers an international platform for experts in UV LED technology and applications, who are invited to participate as a speaker, attendee, exhibitor and/or sponsor. For more information, visit http://www.ICULTA.com.
Design Students Encouraged to Enter Poster Competition
The Technical Association for the Graphic Arts (TAGA) and RadTech are partnering again on the UV+EB Technology Student Poster Design Competition, which offers students cash prizes for creative poster designs. Experience in UV/EB technology – while widely used in graphic arts and food packaging, as well as in 3D printing/additive manufacturing, electronics and a number of metal, wood and plastics applications – is not required.
RadTech will display and celebrate winning entries at the 2020 RadTech Conference at Disney’s Coronado Springs Resort in Orlando, Florida, March 9 through 12, 2020.
Entries must be submitted to RadTech by December 31, 2019. Interested graphic arts and design students are encouraged to learn more and register at https://www.taga.org/radtech/.
RadTech Joins Academy of Inventors to Create Trade Association Chapter
RadTech has joined the National Academy of Inventors as a Member Institution. The academy is a US nonprofit organization dedicated to encouraging inventors and recognizing achievements that have made a “tangible impact on the quality of life, economic development and the welfare of society.” While traditionally focused on academia, NAI has accepted RadTech as the first nonprofit trade association chapter.
“In recognition of the many inventors in our technology space, and to build on RadTech’s fast developing ‘RadLaunch’ effort to support start-ups, we look forward to the opportunity to engage with the NAI community and are excited to start our own, unique UV+EB focused chapter,” said Eileen Weber, RadTech president, and global marketing manager, allnex.
With the rapid advancement of new materials and processes – such as the development of UV LEDs, inkjet and 3D/additive printing – UV/EB research is accelerating across disciplines including medicine, electronics, aerospace and automotive applications. As a Member Institution of the NAI, RadTech now has the opportunity to curate an active technology chapter, including developing mentors and mentees, and submitting nominations for the NAI Senior Members program.
Rapid 3D Print Show Highlights UV Materials
RadTech representatives attended the recent RAPID 3D Printing show in Detroit, Michigan, and report being overwhelmed with the amount of UV technology on the exhibit floor. From long-term RadTech members like Sartomer, Rahn and Kowa to RadLaunch participant companies such as Origin, UV-driven 3D printing and additive manufacturing was on display.
Mickey Fortune, RadTech senior director, said he had conversations with several users, printer manufacturers, service bureaus and chemists. “Our main takeaway was that our strength is in developing bold, enabling materials,” he reported. “Many companies I spoke to were excited about growing their partner networks while focusing on niche applications. We had multiple engaging conversations about the potential for open source development and the need for stronger, production-ready UV materials. We plan on carrying these themes forward as we organize the technical conference for RadTech 2020, March 9 through 11, 2020, in Orlando, Florida.”
Fortune said RadTech attendees should expect several sessions on developing photopolymer materials for stereolithography and other UV-driven 3D printing and additive manufacturing technologies.
Photopolymerization Conference Agenda Available Online
The technical program has been announced for Photopolymerization Fundamentals 2019, September 15 through 18 at Monterey Plaza Hotel & Spa, Monterey, California. The agenda can be viewed at http://radtechintl.org/Photopolymer2019.
The program contains more than a full day of presentations focused on new advances in 3D printing/additive manufacturing and includes a short course with a series of presentations from leaders in the photopolymerizations field: Chris Bowman, University of Colorado, Photopolymerization Kinetics; Allan Guymon, University of Iowa, Statistical Design of Experiments; Jon Scholte, Sartomer, Photopolymerization Chemistry and Curing Methods; and Mike Idacavage, Colorado Photopolymer Solutions, Formulations and 3D Printing. The conference is presented by RadTech and Colorado Photopolymer Solutions.
RadTech Members Among Those Named as Heroes of Chemistry
Longtime Radtech members Adrian and Violeta Lungu are among scientists recently named as Heroes of Chemistry by the American Chemical Society (ACS). The honorees – scientists who developed products that have led to significant advancements in pharmacology, automotive coating and printing – were scheduled to be recognized in a late August ceremony during the ACS National Meeting and Exposition in San Diego, California. Adrian and Violeta Lungu were named – along with DuPont colleagues Robert Blomquist, Mark Hackler and Raj Subramanian – for their discovery and development of DuPont™ Cyrel® EASY.
“We are both in the advanced printing business,” said Adrian Lungu, “working on creating new flexographic printing plate formulations. Cyrel® Packaging Graphics is the largest producer of photosensitive flexographic printing plates.
“For the past five to seven years,” he continued, “the printers have asked for a flat top dot (FTD) technology. Basically, instead of having a very pointy dot on a digital plate, the customers prefer a sturdy dot, without losing the resolution provided by a digital plate. FTD can be achieved by either modifying the digital imager (an IR laser), by reducing the percent oxygen (nitrogen blanket) or by laminating a digitally imaged layer on top of a regular plate. All these options require additional investment from our customers, and it can be more time consuming. Our team decided to create the FTD within the plate and called it EASY technology. We modified the kinetics of photopolymerization reaction in such a way that we can create FTD in the plate.”
Adrian Lungu, a principal investigator, has worked at DuPont since 1997. His research in advanced printing focuses on development of new flexographic printing plates and analysis of different kinetic mechanisms of photopolymerization in rubber-like matrices. Violeta Lungu is a research investigator in Cyrel advanced printing, electronics and imaging communications. She has been working for the past 20 years on formulation and development of new chemistries for flexography based on a cross-disciplinary approach with expertise in photopolymerization, acrylate and epoxy formulations used in adhesives, coatings and flexographic printing plates.